10% chegirma bering
Maslahat bering ushbu kitobni do'stingiz sotib olganidan 298 090,65 soʻm oling.
0+
matnPDF
Hajm 274 sahifalar
Atomic Layer Deposition
Principles, Characteristics, and Nanotechnology Applications
matnPDF
2 980 906,43 soʻm
Kitob haqida
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Janrlar va teglar
Izoh qoldiring
Kirish, kitobni baholash va sharh qoldirish
Kitob tavsifi
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Kitob David Cameron, Arthur Sherman «Atomic Layer Deposition» — veb-saytda onlayn o'qing. Fikr va sharhlar qoldiring, sevimlilarga ovoz bering.
Yosh cheklamasi:
0+Litresda chiqarilgan sana:
02 oktyabr 2018Hajm:
274 Sahifa ISBN:
9781118747421Umumiy o'lcham:
3.3 МБUmumiy sahifalar soni :
274Matbaachilar:
Mualliflik huquqi egasi:
John Wiley & Sons Limited
